Samsung doubts the need for ASML High-NA EUV lithography machines

Last December, a delegation of Samsung Electronics executives in the Netherlands agreed with colleagues from ASML to build a research center in South Korea, and also outlined a schedule for the purchase of advanced equipment for the next ten years. Since then, the management of Samsung’s electronic devices division has changed, and it is no longer so optimistic about the program for purchasing scanners from ASML.

Image Source: Samsung Electronics

As Business Korea explains, the initial agreements with ASML implied that Samsung would purchase at least three ASML lithography scanners in each of the Twinscan EXE:5200, EXE:5400 and EXE:5600 lines within ten years. Now, as it became known to Korean sources, Samsung this month notified ASML of its intentions to limit the range of purchased lithography systems to a certain number of Twinscan EXE:5200, and not rush to purchase subsequent models.

Moreover, Samsung has suspended preparations for the construction of a research center in the Korean Hwaseong, which should receive all this equipment. Official representatives of Samsung Electronics did not want to confirm the information, noting that nothing has changed in the company’s plans to purchase High-NA EUV equipment from ASML. “The joint research center of the two companies will be located in an optimal location,” they added.

Unofficial sources link such impending changes in Samsung’s course with the May appointment of Jun Young-hyun to the post of head of the Device Solutions division, since the initial agreements with ASML were reached by his predecessor. Perhaps, as soon as the new management of the division decides on long-term plans, cooperation with ASML will be resumed under new conditions, if necessary.